Metallized Ceramic Housing for Power Semiconductors
Metallized Ceramic Housing for Power Semiconductors
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Metallized Ceramic Housing for Power Semiconductors
The description of
Metallized Ceramic Housing for Power Semiconductors
We have been supplying a variety of different ceramic grades with metallization, including 95% alumina, 99% alumina, zirconia, beryllia oxides. It makes us unable to meet the different need from different customers.
Metallized Ceramic Housing for Power Semiconductors
The metalized alumina ceramic housings we manufactured are famous for the excellent bonding strength, dense, non-porous ceramic body and vacuum-tight performance, good high-temperature characteristics, and low coefficient of expansion, and so on.
Jointing types:
1.Alumina ceramic base + Ag plating
2.Alumina ceramic base + Mo/Mn metallization
3.Alumina ceramic base + Mo/Mn metallization + Ni plating
4. Alumina ceramic base + Tungsten metalized + Au plating
Cosmetic quality:
1. The flatness of both end sides must be less than 0,01mm
2.No blister on nickel ( outer) plating at the temperature up to 1150°C
3.No any crack on the surface
4.No any dark spot ( impurities) on the external surface
5.With evenly glaze distribution
Application:
Diode, Gas triode, Vacuum thyristor, the X-ray tube, and so on.
Overview of Main Physical Properties:
1.Good electrical insulation
2.High mechanical strength
3.Excellent wear resistance
4.Excellent corrosion resistance
5.Low dielectric constant
Overview of Main Applications:
1.Pump seals and other components
2.Wear resistant inserts
3.Insulating washers or bushings
4.Semiconductor components
5.Aerospace components
6.Automotive sensors
7.Electrical or electronic insulators
Metallized Ceramic Housing for Power Semiconductors
Descriptions of Metallization Processing:
Metallization Processing (See Process Description Below) | Outer Diameter and Inner Diameter Banding |
Brush | |
Screen Printing | |
Spray | |
Needle | |
Base Metallization Materials | Moly Manganese |
Tungsten Manganese | |
Moly Tungsten Manganese | |
Materials for Metallization | Aluminum Oxide |
Beryllium Oxide (Restrictions Apply) | |
Metallization Characteristics/Benefits | Low Temperature Firing |
Universally Applicable | |
Process Speed | |
Uniform Coating, Thickness and Density | |
No substrate deformation | |
Metallization Equipment | Domestic Furnaces |
Industry Focus | Department of Defense |
Department of Energy | |
Solar Product Manufacturing | |
Aerospace | |
Biomedical | |
Communications | |
Computer and Electronics | |
Vacuum Electronics | |
Medical | |
Military | |
Semiconductor | |
Optical | |
Intended Applications for Metallization Products | Traveling Wave Tubes |
Vacuum Electronic Devices | |
Medical Devices | |
Photon Machines | |
Neutron Generators | |
X-Ray Tubes | |
Klystrons | |
High Vacuum Feed Through | |
Relay Insulators | |
E-Beam Technology |
Available Metallization&Plating Specifications:
Available Ceramic Compositions | Al2O3 94%,97%,99.5% |
Available Metallization Materials | Mo/Mn |
Metallization Thickness | 25±10um |
Available Plating Materials | Ni/Ag/Au |
Plating Thickness | 2-10um |
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