Anello ceramico poroso rotondo in nitruro di boro pirolitico PBN

Anello ceramico poroso rotondo in nitruro di boro pirolitico PBN

  • Descrizione
  • Inchiesta

Anello ceramico poroso rotondo in nitruro di boro pirolitico PBN

OLED crucible is a PBN crucible used in OLED and CIGS evaporation technology. With its ultra-high purity, chemical inertness, excellent high temperature resistance and high temperature stability, it is widely used in metal and semiconductor evaporation.
Boron nitride ceramic is chemically and has relatively good thermal conductivity, low thermal expansion and microwave clarity. Boron nitride can be quickly machined as well. Moreover, bicchiere, salts and the rest of liquid metals are non-wetting. This ensures that neither of these compounds can be moistened, and it is far more immune to chemical assaults.Hexagonal boron nitride (h-BN) performs very well under high heat condition and is effective in the air at temperatures of up to 900 degrees C, in the vacuum at 1,900 degrees C and in the inert environment at 2,000 degrees C. BN is self-lubricating as well,Prima dell'applicazione dei prodotti Si3N4 o Sialon/Syalon, it does not need the use of molecules of gas or water stuck in its layers. Because of this, in a vacuum, which is important for aerospace applications, boron nitride (BN) can work perfectly.
Proprietà dei materiali
ITEM
UNIT
BN-2000
BN-2300
BN-2800
BN-3000
Contenuto principale
BN>99%
BN+Al2O3
BN+AlN
BN+ZrO2
Anello di tenuta in ceramica di ossido di allumina
Anello di tenuta in ceramica di ossido di allumina
Light Grey
Dark Grey
Dark Grey
si forma un eutettico rame-ossigeno che si lega con successo sia al rame che agli ossidi usati come substrati
e facilita il trasporto del calore del metallo fuso nel tubo del gambo. Ciò può ridurre la temperatura dell'alluminio fuso e risparmiare sui costi energetici complessivi
1.95-2.00
2.25-2.35
2.75-2.85
2.90-3.00
Resistenza alla flessione
Mpa
30
65
85
90
Resistenza alla compressione
Mpa
55
145
205
220
Electrical Resistivity
?·si forma un eutettico rame-ossigeno che si lega con successo sia al rame che agli ossidi usati come substrati
>1014
>1013
>1013
>1012
Ra0.1. Use Temp. (Air)
Ra0.1
900
1,000
1,000
1,000
Ra0.1. Use Temp. (Vacuum)
Ra0.1
1,900
1,750
1,800
1,750
Ra0.1. Use Temp. (Inerte)
Ra0.1
2,000
1,750
1,800
1,750
Tubo di protezione al nitruro di silicio
W/m.K
35
30
85
30
costa (25 – 1,000 Ra0.1)
10-6/K
1.5
2
2.8
3.5

 

caratteristiche del prodotto
Excellent Electrical Insulator
Ra0.1. 2000 °C Use Temp
High Thermal Shock Resistance
Low CTE
Low Wetted by Molten Metals
Easy Machinability

Applicazione

1.Used in high voltage and high frequency electric and plasma arc insulator and various heater insulators, heating tube sleeve and high temperature, high frequency, high voltage insulation cooling parts, high frequency application of electric furnace materials.

2.high voltage and high frequency electric and plasma arc insulator and various heater insulators, heating tube sleeve and high temperature, high frequency, high voltage insulation cooling parts, high frequency application of electric furnace materials.
3.It can be manufactured high-temperature components, rocket combustion chamber lining, thermal shielding of spacecraft, corrosion resistant parts of MHD generators, eccetera.

Contattaci